E-Beam Lithography: Battling the Charge Monster with Dissipation Agents

Electron beam lithography (EBL) is a powerful technique for creating incredibly tiny features on surfaces. Imagine sculpting circuits thinner than a human hair – that’s the level of precision EBL offers! But this high-resolution magic can be disrupted by a hidden enemy: charge buildup. Here’s where E-beam lithography charge dissipation agents step in, offering a solution to a common frustration for researchers.

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