Hydrogen Silesquioxane
Our hydrogen silesquioxane is a high-performance material designed for electron beam lithography applications. Known for its superior resolution and etch resistance, this resist enables the fabrication of intricate micro- and nanostructures with exceptional accuracy. DisChem’s hydrogen silesquioxane is available in various concentrations, making it adaptable for different film thicknesses and application requirements. Count on us to deliver the quality and consistency you need for your most demanding projects.
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