Hydrogen Silsesquioxane Ebl Negative
Achieve unmatched pattern precision with hydrogen silsesquioxane ebl Negative from DisChem. This negative tone resist is engineered for direct-write thin film applications, offering excellent pitch resolution and sensitivity. Its adaptability allows for use in a wide range of microfabrication processes, from semiconductor manufacturing to nanotechnology research. With hydrogen silsesquioxane ebl Negative, you can expect reliable, high-resolution results that support your innovation goals.
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