We know sputtering targets come in a wide variety of materials that depend on the specific application. It is a material that acts or serves as the source for thin film. It is a technique of physical vapour deposition where atoms are expelled from a target material or sputtering target. This then gets deposited onto a substratum to form the thin film. The properties and performance of the thin film are affected and influenced significantly due to the quality of the sputtering target.

The composition and combination of sputtering targets decide the properties and characteristics of the film, like its electrical and mechanical aspects. These sputtering targets include metals, alloys, and composite materials. Metals such as gold, copper, silver, and aluminum, alloy targets such as stainless steel and brass, and magnetic targets like cobalt and iron.

Knowing about the characteristics

One of the most intriguing combinations that has garnered attention is the combo of milled carbon fibre and iron spherical particles in sputtering targets. These combinations have been tried, and when blended, the combination exhibited unique electrical, magnetic, and mechanical properties. This interesting combination makes them highly desirable with respect to thin film applications.

Milled carbon fibre is known for its lightweight specification and electrical conductivity. This fibre holds immense mechanical strength as it is a finely chopped form of carbon fibre. These fibres are used in sputtering targets as they provide several benefits.

Source: https://nanoresearch-elements.hashnode.dev/sputtering-targets