HSQ Photoresist
DisChem’s HSQ photoresist is a high-performance, negative-tone resist used for advanced lithographic processes. This hydrogen silsesquioxane-based resist is ideal for applications requiring high resolution and low line-edge roughness, making it a preferred choice for nanofabrication. HSQ photoresist is widely used in semiconductor manufacturing, MEMS devices, and other industries that require precise patterning at the nanoscale.
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